rf driven multicusp H− ion source
نویسندگان
چکیده
منابع مشابه
Application of a Pulsed , RF - driven ) Multicusp Source for Low Energy Plasma Immersion Ion Implantation
The multicusp ion source has the capability of producing large volumes of uniform, quiescent, high density plasmas. Due to the versatility of the multicusp source, a plasma chamber suited for plasma immersion ion implantation (PIII) was readily constructed. Conventional PIII pulses the bias voltage applied to the substrate which is immersed in a CW mode plasma. However, in the interest of findi...
متن کاملMulticusp ion source with external RF antenna for production of H− ions
A multicusp ion source with modular design was developed at LBNL for production of H− ions. The source consists of a front plate, two multicusp front chambers, a quartz flange with external 3-loop RF antenna and a rear multicusp chamber. The source has LaB6 sputtering target at the rear chamber to lower the work function of the surfaces by coating them with LaB6 and an external cesium oven on t...
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At LBNL we are investigating the use of gaseous ion sources for induction linac applications such as heavy ion inertial fusion. Typical requirements for the ion source is to produce 20 μs pulses with a rise-time of 2 μs. The current density should be greater than 100 mA/cm2 at a duty cycle of 10 Hz [1]. Noble gases such as krypton, neon and xenon will be used. The source used for the measuremen...
متن کاملStudy of RF Source Ignition System with Impedance Matching Network for RF Driven H
This paper presents study of a 6.78 MHz RF source with impedance matching network based inductively coupled plasma generator ignition system for an Hion source. Two types of 10 turn RF antenna (solenoid coil) were developed, to couple the RF power to the ignition plasma chamber. The antenna’s electric parameters were measured using Vector Network Analyzer (VNA). A copper conductor of 3 x 4 mm s...
متن کاملCompact RF ion source for industrial electrostatic ion accelerator.
Korea Multi-purpose Accelerator Complex is developing a single-ended electrostatic ion accelerator to irradiate gaseous ions, such as hydrogen and nitrogen, on materials for industrial applications. ELV type high voltage power supply has been selected. Because of the limited space, electrical power, and robust operation, a 200 MHz RF ion source has been developed. In this paper, the accelerator...
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ژورنال
عنوان ژورنال: Review of Scientific Instruments
سال: 1991
ISSN: 0034-6748,1089-7623
DOI: 10.1063/1.1142315